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code:pg_0609_07
PDF/月刊誌論文/code:pg_0609_07 マテリアル インテグレーション 2006年9月号
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2,200
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2,200
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電子出版物(マテリアルインテグレーション論文)
> 2006
PDF/月刊誌論文/code:pg_0609_07 マテリアル インテグレーション 2006年9月号
ELECTRONIC CERAMICS エレクトロニクセラミックス薄膜
Magnetoresistance of Co(Pt)-ITO nanocomposite films
■著者
Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology Ji Shi
■要約
The results on the fabrication, magnetoresistance and structure of Co-ITO, Co(Pt)-ITO films are reviewed in this article. It is found that small amount of Co can be incorporated into amorphous ITO films during sputtering deposition, and then Co atoms precipitate out as nanometer-sized particles, forming Co-ITO nanocomposite microstructure exhibiting tunneling type magnetoresistance. By adding Pt into the films, more metal atoms (Co, Pt) can be incorporated into the amorphous phase, and the thermal stability of amorphous ITO is improved. This facilitates the control of microstructure of the films through thermal annealing. Oxygen partial pressure during deposition also strongly affects the magnetoresistance of Co(Pt)-ITO nanocomposite films.
